Two-color InGaAsGaAs quantum dot infrared photodetectors by selective area interdiffusion

Abstract

We report the postgrowth fabrication of two-color InGaAs∕GaAs quantum dot infrared photodetectors (QDIPs). By capping half of the as-grown QDIP structure with titanium dioxide (TiO2) and performing rapid thermal annealing under the optimized condition, a blueshifted photoluminescence from the uncapped region was obtained compared with the TiO2 covered region. The corresponding device spectral photoresponse from the two adjacent regions exhibited a shift of 0.8μm around the wavelength of 6μm. This is a result of the simultaneous promotion and suppression of thermal interdiffusion during rapid thermal annealing.

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