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Evaluation of 2.45 GHz Microwave Plasma for Conductive Glass
Amaliyah N.
Aip Conference Proceedings
Abstract
Recently, a new technology of the low cost and high stability under solar radiation was developed which is known as dye-sensitized solar cell (DSSC). The manufacturing of DSSC requires transparent conducting glass that act as an electrode. This layer is necessary since it allows sunlight penetrating into the cell. In this study, an investigation of coating process on conductive glass surface using 2.45 GHz microwave plasma was conducted for further application in DSSC. The solution was made from pure water and Titanium dioxide (TiO2). Effect of plasma irradiation time at 1, 3, and 5 minutes in a solution was observed. Result shows that surface roughness and thickness increased as the increasing of plasma irradiation time, which optimum coating surface of 1.127 µm (roughness) can be obtained at shorter plasma irradiation time. However, the coating thickness was found to be far from the optimum range for application in DSSC. The coating surface morphology showed an increasing pore formation and agglomeration particles observed on the conductive glass surface.